Research Officer, Semiconductor Plasma Etch

Discover the possible

Anything is possible at the NRC, named in 2025 one of Canada’s Top Employers for Young People, Top Employer in the National Capital Region and Forbes Canada’s Best Employers!

As Canada’s leading research and technology organization, our world-renowned research pushes the boundaries of science and engineering to make the impossible, possible. Every day we explore new ideas through innovative research and help companies discover possibilities that impact Canada’s future and the world.

At the NRC, you’ll also discover new possibilities. Our supportive workplace fosters a culture of creativity, welcoming fresh perspectives and innovation at all levels. We value teamwork. You’ll collaborate across multiple fields and with the brightest minds to find creative solutions. Most importantly, you’ll discover what’s possible within you as you grow, make valuable contributions and progress in your professional journey. From ground-breaking discoveries to a life-changing career, discover your possible at the NRC.

The role

We are looking for a Research Officer, Semiconductor Plasma Etch to support the Advanced Technology Fabrication (ATF) facility at the Quantum Nanotechnology Research Centre. The Research Officer would be someone who shares our core values of Integrity, Excellence, Respect and Creativity.

Working with clients and partners, the National Research Council Canada provides strategic research, innovation support, scientific, and technical services to develop and deploy solutions to meet Canada's current and future industrial and societal needs. The ATF offers our clients and partners access to cutting-edge semiconductor research and fabrication capabilities providing simulation, design, fabrication, testing, characterization, and prototyping. Bringing cutting edge research to the benefit of Canadian society and industries.

The key activities of the Research Officer Plasma Etch are:

• Designing new dry etch recipes (Cl2, BCl3, CH4, SF6, CHF3, N2, O2, Ar, etc) for compound semiconductors to achieve desired etch rates, selectivity, and anisotropy.
• Developing processes that ensure smooth, anisotropic sidewalls, particularly for high-aspect-ratio features or advanced device structures.
• Operating and maintaining plasma processing tools to ensure availability and consistency.
• Utilizing the relevant metrology tools to evaluate etched structures, film properties, and sidewall profiles.
• Generating detailed reports for internal stakeholders, writing application notes, and publishing findings in scientific journals.

Screening criteria

Applicants must demonstrate within the content of their application that they meet the following screening criteria in order to be given further consideration as candidates:

Education

Master’s degree in Physical, Chemical, Materials Sciences or equivalent Engineering disciplines.

A PhD in one of these disciplines will be considered an asset.

For information on certificates and diplomas issued abroad, please see Degree equivalency

Experience

• Significant recent** hands-on experience in a semiconductor fabrication environment.
• Significant experience in reactive ion etching (RIE) and inductively coupled plasma etch (ICP-RIE) of semiconductor materials using various chemistries. 
• Significant and recent ** hands-on experience in design of experiments for determining process parameters monitoring semiconductor fabrication processes including the use of characterization equipment.
• Hands on experience with Oxford plasma etch systems would be considered an asset.

** Significant experience is defined as two (2) to five (5) years of experience.
*** Recent experience is defined as experience acquired within the last five (5) years.

Condition of employment

Reliability Status

For a Reliability Status, verification of background information over a period of 5 years is required.

Language requirements

English 

Information on language requirements and self-assessment tests

Assessment criteria

Candidates will be assessed on the basis of the following criteria:

Technical competencies

• Solid knowledge of plasma etch principles, processes and characterization techniques.
• Knowledge of qualifying and maintaining plasma etch tools.
• Demonstrative ability to design a Design of Experiment to achieve a desired outcome.
• Demonstrated ability to integrate plasma etch steps into complex process blocks in the fabrication of semiconductor-based devices; and
• Solid knowledge of safe working practices in a semiconductor device fabrication environment; including working with chemicals, compressed gases, liquid nitrogen, and electrical, mechanical and vacuum systems. 

Behavioural competencies

Competency Profile(s)

For this position, the NRC will evaluate candidates using the following competency profile: Research

View all competency profiles

Compensation

This position is classified as a Research Officer (RO), a group that is unique to the NRC. Candidates are remunerated based on their expertise, outcomes and impacts of their previous work experience relative to the requirements of the level. The salary scale for this group is vast, from $64,739 to $183,010 per annum, which permits for employees of all levels from new graduates to world renowned experts to be fairly compensated for their contributions.

NRC employees enjoy a wide-range of competitive benefits including a robust pension plan, comprehensive health and dental coverage, disability and life insurance, office closure at the end of December, and additional supports to enhance your well-being throughout your career and beyond.

Notes

• Relocation assistance will be determined in accordance with the NRC's directives.
• ​A pre-qualified list may be established for similar positions for a one year period.
• Preference will be given to Canadian citizens and permanent residents of Canada. Please include citizenship information in your application.
• The incumbent must adhere to safe workplace practices at all times.
• We thank all those who apply, however only those selected for further consideration will be contacted.